The origin of contrast in the imaging of doped areas in silicon by slow electrons
- Publication type:
- Journal article
- Metadata:
-
- Autoren
- Luděk Frank
- Ilona Müllerová
- Dimitrii A Valdaitsev
- Andrei Gloskovskii
- Sergei A Nepijko
- Hans-Joachim Elmers
- Gerhard Schönhense
- Sammlungen
- metadata
- ISSN
- 0021-8979
- Ausgabe der Veröffentlichung
- 9
- Zeitschrift
- Journal of applied physics
- Schlüsselwörter
- 530 Physik
- 530 Physics
- Sprache
- eng
- Paginierung
- Seiten: 093712-1 - 093712-5
- Datum der Veröffentlichung
- 2006
- Herausgeber
- AIP
- Herausgeber URL
- http://dx.doi.org/10.1063/1.2364044
- Datum der Datenerfassung
- 2020
- Datum, an dem der Datensatz öffentlich gemacht wurde
- 2020
- Zugang
- Public
- Titel
- The origin of contrast in the imaging of doped areas in silicon by slow electrons
- Ausgabe der Zeitschrift
- 100
Data source: METADATA.UB
- Other metadata sources:
-
- Autoren
- Ludek Frank
- Ilona Mullerova
- Dimitrii A Valdaitsev
- Andrei Gloskovskii
- Sergei A Nepijko
- Hans-Joachim Elmers
- Gerd Schoenhense
- Autoren-URL
- https://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=fis-test-1&SrcAuth=WosAPI&KeyUT=WOS:000242041500050&DestLinkType=FullRecord&DestApp=WOS_CPL
- DOI
- 10.1063/1.2364044
- eISSN
- 1089-7550
- Externe Identifier
- Clarivate Analytics Document Solution ID: 105OO
- ISSN
- 0021-8979
- Ausgabe der Veröffentlichung
- 9
- Zeitschrift
- JOURNAL OF APPLIED PHYSICS
- Artikelnummer
- ARTN 093712
- Datum der Veröffentlichung
- 2006
- Status
- Published
- Titel
- The origin of contrast in the imaging of doped areas in silicon by slow electrons
- Sub types
- Article
- Ausgabe der Zeitschrift
- 100
Data source: Web of Science (Lite)
- Abstract
- <jats:p>The importance of high resolution imaging of dopant contrast in semiconductor structures parallels the continuous increase in the degree of their integration and complexity and in the size of substrates. Some scanning electron microscopy modes show moderate contrast between differently doped areas, but its detailed interpretation remains questionable, in particular, as regards the measurement of the dopant concentration. Photoemission spectromicroscopy on silicon substrates with patterns of opposite-type dopants suggests that the p∕n contrast is primarily related to local differences in the absorption of hot electrons along their trajectory toward the surface. This explanation is also expected to be valid in the interpretation of image contrasts formed by secondary electrons or very slow backscattered electrons. Wide-field photoemission electron microscopy has proven itself a fast imaging method providing large p-n contrast and the prospect of high-level resolution.</jats:p>
- Autoren
- Luděk Frank
- Ilona Müllerová
- Dimitrii A Valdaitsev
- Andrei Gloskovskii
- Sergei A Nepijko
- Hans-Joachim Elmers
- Gerd Schönhense
- DOI
- 10.1063/1.2364044
- eISSN
- 1089-7550
- ISSN
- 0021-8979
- Ausgabe der Veröffentlichung
- 9
- Zeitschrift
- Journal of Applied Physics
- Sprache
- en
- Online publication date
- 2006
- Datum der Veröffentlichung
- 2006
- Status
- Published
- Herausgeber
- AIP Publishing
- Herausgeber URL
- http://dx.doi.org/10.1063/1.2364044
- Datum der Datenerfassung
- 2023
- Titel
- The origin of contrast in the imaging of doped areas in silicon by slow electrons
- Ausgabe der Zeitschrift
- 100
Data source: Crossref
- Beziehungen:
- Property of