An efficient approach to global sensitivity analysis and parameter estimation for line gratings

Publikationstyp:
Zeitschriftenaufsatz
Metadaten:
Autoren
  • Nando Farchmin
  • Martin Hammerschmidt
  • Philipp-Immanuel Schneider
  • Matthias Wurm
  • Bernd Bodermann
  • Markus Baer
  • Sebastian Heidenreich
Autoren-URL
https://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=fis-test-1&SrcAuth=WosAPI&KeyUT=WOS:000502116400014&DestLinkType=FullRecord&DestApp=WOS_CPL
DOI
10.1117/12.2525978
eISSN
1996-756X
Externe Identifier
  • Clarivate Analytics Document Solution ID: BO1QY
ISSN
0277-786X
Zeitschrift
MODELING ASPECTS IN OPTICAL METROLOGY VII
Schlüsselwörter
  • uncertainty quantification
  • polynomial chaos
  • global sensitivity analysis
  • inverse problem
  • parameter reconstruction
  • scatterometry
Artikelnummer
UNSP 110570J
Datum der Veröffentlichung
2019
Status
Published
Titel
An efficient approach to global sensitivity analysis and parameter estimation for line gratings
Sub types
  • Proceedings Paper
Ausgabe der Zeitschrift
11057

Datenquelle: Web of Science (Lite)

Andere Metadatenquellen:
Autoren
  • Nando Farchmin
  • Martin Hammerschmidt
  • Philipp-Immanuel Schneider
  • Matthias Wurm
  • Markus Bär
  • Sebastian Heidenreich
DOI
10.1117/12.2525978
Editoren
  • Bernd Bodermann
  • Karsten Frenner
  • Richard M Silver
Zeitschrift
Modeling Aspects in Optical Metrology VII
Datum der Veröffentlichung
2019
Status
Published
Herausgeber
SPIE
Herausgeber URL
http://dx.doi.org/10.1117/12.2525978
Datum der Datenerfassung
2019
Titel
Efficient global sensitivity analysis for silicon line gratings using polynomial chaos

Datenquelle: Crossref

Abstract
Scatterometry is a fast, indirect and nondestructive optical method for the quality control in the production of lithography masks. Geometry parameters of line gratings are obtained from diffracted light intensities by solving an inverse problem. To comply with the upcoming need for improved accuracy and precision and thus for the reduction of uncertainties, typically computationally expansive forward models have been used. In this paper we use Bayesian inversion to estimate parameters from scatterometry measurements of a silicon line grating and determine the associated uncertainties. Since the direct application of Bayesian inference using Markov-Chain Monte Carlo methods to physics-based partial differential equation (PDE) model is not feasible due to high computational costs, we use an approximation of the PDE forward model based on a polynomial chaos expansion. The expansion provides not only a surrogate for the PDE forward model, but also Sobol indices for a global sensitivity analysis. Finally, we compare our results for the global sensitivity analysis with the uncertainties of estimated parameters.
Autoren
  • Nando Farchmin
  • Martin Hammerschmidt
  • Philipp-Immanuel Schneider
  • Matthias Wurm
  • Bernd Bodermann
  • Markus Bär
  • Sebastian Heidenreich
Autoren-URL
http://arxiv.org/abs/1910.14435v1
Zeitschrift
Proc. SPIE 11057, Modeling Aspects in Optical Metrology VII, 110570J (21 June 2019)
Schlüsselwörter
  • physics.data-an
  • physics.data-an
  • physics.acc-ph
Datum der Veröffentlichung
2019
Herausgeber URL
http://dx.doi.org/10.1117/12.2525978
Datum der Datenerfassung
2019
Datum, an dem der Datensatz öffentlich gemacht wurde
2019
Titel
An efficient approach to global sensitivity analysis and parameter estimation for line gratings

Files

1910.14435v1.pdf

Datenquelle: arXiv

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