Nanolithographic Top-Down Patterning of Polyoxovanadate-based Nanostructures with Switchable Electrical Resistivity

Publikationstyp:
Zeitschriftenaufsatz
Metadaten:
Autoren
  • Benedikt Roesner
  • Roberto Fallica
  • Manuel Johnson
  • Andreas Spaeth
  • Rainer Fink
  • Yasin Ekinci
  • Christian David
  • Montaha H Anjass
  • Carsten Streb
Autoren-URL
https://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=fis-test-1&SrcAuth=WosAPI&KeyUT=WOS:000561082100001&DestLinkType=FullRecord&DestApp=WOS_CPL
DOI
10.1002/cnma.202000425
Externe Identifier
  • Clarivate Analytics Document Solution ID: OM8FR
ISSN
2199-692X
Ausgabe der Veröffentlichung
11
Zeitschrift
CHEMNANOMAT
Schlüsselwörter
  • Polyoxometalates
  • Vanadium Oxide
  • Nanostructure
  • Self-Assembly
  • Metal Oxide
Paginierung
1620 - 1624
Datum der Veröffentlichung
2020
Status
Published
Titel
Nanolithographic Top-Down Patterning of Polyoxovanadate-based Nanostructures with Switchable Electrical Resistivity
Sub types
  • Article
Ausgabe der Zeitschrift
6

Datenquelle: Web of Science (Lite)

Andere Metadatenquellen:
Abstract
<jats:title>Abstract</jats:title><jats:p>The top‐down lithographic fabrication of functional metal oxide nanostructures enables technologically important applications such as catalysis and electronics. Here, we report the use of molecular vanadium oxides, polyoxovanadates, as molecular precursors for electron beam lithography to obtain functional vanadium oxide nanostructures. The new resist class described gives access to nanostructures with minimum dimensions close to 10 nm. The lithographically prepared structures exhibit temperature‐dependent switching behaviour of their electrical resistivity. The work could lay the foundation for accessing functional vanadium oxide nanostructures in the sub‐10‐nm domain using industrially established nanolithographic methods.</jats:p>
Autoren
  • Benedikt Rösner
  • Roberto Fallica
  • Manuel Johnson
  • Andreas Späth
  • Rainer Fink
  • Yasin Ekinci
  • Christian David
  • Montaha H Anjass
  • Carsten Streb
DOI
10.1002/cnma.202000425
eISSN
2199-692X
ISSN
2199-692X
Ausgabe der Veröffentlichung
11
Zeitschrift
ChemNanoMat
Sprache
en
Online publication date
2020
Paginierung
1620 - 1624
Datum der Veröffentlichung
2020
Status
Published
Herausgeber
Wiley
Herausgeber URL
http://dx.doi.org/10.1002/cnma.202000425
Datum der Datenerfassung
2023
Titel
Nanolithographic Top‐Down Patterning of Polyoxovanadate‐Based Nanostructures with Switchable Electrical Resistivity
Ausgabe der Zeitschrift
6

Datenquelle: Crossref

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